Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-08-08
2006-08-08
Hoang, Quoc (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S782000, C438S508000, C257S079000
Reexamination Certificate
active
07087526
ABSTRACT:
A method of CaO-doped SrCu2O2spin-on precursor synthesis and low temperature p-type thin film deposition, includes preparing a wafer to receive a spin-coating thereon; selecting metalorganic compounds to form a SrCu2O2precursor, mixing and refluxing the metalorganic compounds to form a precursor mixture; filtering the precursor mixture to produce a spin-coating precursor; applying the spin-coating precursor to the wafer in a two-step spin coating procedure; baking the spin-coated wafer using a hot-plate bake to evaporate substantially all of the solvents; and annealing the spin-coated wafer to form a CaO-doped SrCu2O2layer thereon.
REFERENCES:
patent: 6914268 (2005-07-01), Shei et al.
Ohta et al.,Fabrication and Current Injection UV-light Emission from a transparent p-n Heterojunction Composed of p-SrCu2O2and n-ZnO, Key Engineering Materials, vol. 214-215 pp. 75-80 (2002).
Martinson,Synthesis of Single Phase SrCu2O2from liquid precursors, Journal of Young Investigators, vol. 10, Issue 3, Mar. 2004.
Nie et al.,First-principles study of transparent p-type conductive SrCu2O2and related compounds, Physical Review B, vol. 65, 2002, pp. 075111.
Gao Wei
Ono Yoshi
Zhuang Wei-Wei
Hoang Quoc
Sharp Laboratories of America Inc.
Varitz PC Robert D.
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