Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-12-19
2006-12-19
Le, Hoa Van (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C526S242000, C526S281000
Reexamination Certificate
active
07150957
ABSTRACT:
Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I)wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
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DiPietro Richard A.
Ito Hiroshi
International Business Machines - Corporation
Le Hoa Van
Mintz Levin Cohn Ferris Glovsky and Popeo P.C.
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