Exposure method

Details Exposure method Exposure method

2006-12-12

2006-12-12

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07148956

ABSTRACT:
Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.

REFERENCES:
patent: 5309197 (1994-05-01), Mori et al.
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5602399 (1997-02-01), Mizutani
patent: 5783833 (1998-07-01), Sugaya et al.
patent: 6281966 (2001-08-01), Kenmoku
patent: 6522386 (2003-02-01), Nishi
patent: 6559465 (2003-05-01), Yamada et al.
patent: 6744512 (2004-06-01), Takahashi
patent: 6813000 (2004-11-01), Nishi
patent: 7046333 (2006-05-01), Ohsaki

Affiliated with

Also associated with

No associations

Rating

Exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3688009