Method of manufacturing microlens array

Details Method of manufacturing microlens array Method of manufacturing microlens array

2006-10-31

2006-10-31

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S330000, C216S026000

Reexamination Certificate

active

07129027

ABSTRACT:
A positive resist layer formed on a translucent substrate is subjected to exposure and development to form circular resist patterns disposed near each other at a predetermined distance. The exposure pattern has an opening of a plurality of circular ring shape surrounding the plurality of resist patterns. The opening may have a width equal to the predetermined distance. Since the width of the opening is constant over the whole outer periphery of each resist pattern, uniform exposure can be realized at all positions along the periphery to form a perfect circle shape. After a convex lens shape is given to each resist pattern by heating and reflow process, the convex lens shape is transferred to the substrate by dry etching process using the resist patterns as a mask to form a microlens array with convex lenses.

REFERENCES:
patent: 5079130 (1992-01-01), Derkits, Jr.
patent: 07-174903 (1995-07-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing microlens array does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing microlens array, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing microlens array will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3686874