Objective with fluoride crystal lenses

Optical: systems and elements – Lens – With reflecting element

Reexamination Certificate

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C359S490020

Reexamination Certificate

active

07126765

ABSTRACT:
An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

REFERENCES:
patent: 1332410 (1920-03-01), Potts
patent: 2943993 (1960-05-01), Chromy
patent: 4215288 (1980-07-01), Kato et al.
patent: 4701606 (1987-10-01), Tanimoto et al.
patent: 4993823 (1991-02-01), Schaffer, Jr. et al.
patent: 5042922 (1991-08-01), Pepper
patent: 5625453 (1997-04-01), Matsumoto et al.
patent: 5652745 (1997-07-01), Ishikawa et al.
patent: 5677757 (1997-10-01), Taniguchi et al.
patent: 5867315 (1999-02-01), Koike et al.
patent: 6057970 (2000-05-01), Kim et al.
patent: 6201634 (2001-03-01), Sakuma et al.
patent: 6324003 (2001-11-01), Martin
patent: 6683710 (2004-01-01), Hoffman et al.
patent: 6765717 (2004-07-01), Allan et al.
patent: 6775063 (2004-08-01), Shiraishi
patent: 6782074 (2004-08-01), Sakuma
patent: 6782075 (2004-08-01), Pell
patent: 6785051 (2004-08-01), Allan
patent: 6788389 (2004-09-01), Fujishima et al.
patent: 6829041 (2004-12-01), Unno
patent: 6879379 (2005-04-01), Brunotte et al.
patent: 6963449 (2005-11-01), Mecking et al.
patent: 7027237 (2006-04-01), Mecking et al.
patent: 2003/0000453 (2003-01-01), Unno et al.
patent: 2003/0011893 (2003-01-01), Shiraishi et al.
patent: 2003/0011896 (2003-01-01), Shiraishi
patent: 2003/0012724 (2003-01-01), Burnett et al.
patent: 2003/0021026 (2003-01-01), Allan et al.
patent: 2003/0025894 (2003-02-01), Owa et al.
patent: 2003/0053036 (2003-03-01), Fujishima et al.
patent: 2003/0058421 (2003-03-01), Omura et al.
patent: 2003/0086071 (2003-05-01), McGuire, Jr.
patent: 2003/0086156 (2003-05-01), McGuire, Jr.
patent: 2003/0086157 (2003-05-01), McGuire, Jr.
patent: 2003/0086171 (2003-05-01), McGuire, Jr.
patent: 2003/0099047 (2003-05-01), Hoffman et al.
patent: 2003/0128349 (2003-07-01), Unno
patent: 2003/0168597 (2003-09-01), Webb et al.
patent: 2003/0197946 (2003-10-01), Omura
patent: 2003/0234981 (2003-12-01), Hoffman et al.
patent: 2004/0001244 (2004-01-01), Hoffman et al.
patent: 2004/0008348 (2004-01-01), Kishikawa et al.
patent: 2004/0036961 (2004-02-01), McGuire, Jr.
patent: 2004/0036971 (2004-02-01), McGuire, Jr.
patent: 2004/0036985 (2004-02-01), McGuire, Jr.
patent: 2004/0050318 (2004-03-01), Sakai
patent: 2004/0089023 (2004-05-01), Hiraiwa et al.
patent: 2004/0136084 (2004-07-01), Unno et al.
patent: 2004/0145806 (2004-07-01), McGuire, Jr.
patent: 2004/0156051 (2004-08-01), Takeuchi et al.
patent: 2005/0134967 (2005-06-01), Brunotte et al.
patent: 2005/0157401 (2005-07-01), Goehnermeier et al.
patent: 40 22 904 (1992-01-01), None
patent: 19535392 (1997-03-01), None
patent: 19637563 (1998-03-01), None
patent: 19807120 (1999-08-01), None
patent: 0103485 (1984-03-01), None
patent: 0480616 (1992-04-01), None
patent: 0678768 (1995-10-01), None
patent: 0857985 (1998-08-01), None
patent: 0 942 297 (1999-09-01), None
patent: 0952490 (1999-10-01), None
patent: 0961149 (1999-12-01), None
patent: 1014139 (2000-06-01), None
patent: 1063551 (2000-12-01), None
patent: 1063684 (2000-12-01), None
patent: 1115030 (2001-07-01), None
patent: 1 139 138 (2001-10-01), None
patent: 05-27200 (1993-02-01), None
patent: 09166710 (1997-06-01), None
patent: 11054411 (1997-09-01), None
patent: 11-106296 (1999-04-01), None
patent: 2000-86394 (2000-03-01), None
patent: 2000331927 (2000-11-01), None
patent: 2001108801 (2001-04-01), None
patent: WO91/14189 (1991-09-01), None
patent: WO 0031592 (2000-06-01), None
patent: WO00/70407 (2000-11-01), None
patent: WO 01/01182 (2001-01-01), None
patent: 01/02799 (2001-01-01), None
patent: WO-01/50171 (2001-07-01), None
patent: WO01/50171 (2001-07-01), None
patent: WO02/093201 (2002-11-01), None
patent: WO-02/093209 (2002-11-01), None
patent: WO 02/097508 (2002-12-01), None
patent: WO-02/099500 (2002-12-01), None
patent: WO03/003072 (2003-01-01), None
patent: WO03/003429 (2003-01-01), None
patent: WO03/007045 (2003-01-01), None
patent: WO-03/009017 (2003-01-01), None
patent: WO-03/023481 (2003-03-01), None
patent: WO 03/038479 (2003-05-01), None
patent: WO 03/046634 (2003-06-01), None
patent: WO 04/019077 (2004-03-01), None
Burnett et al., “Preliminary Determination of an Intrinsic Birefringence in CaF2”, dated May 7, 2001, 2ndInternational Symposium on 157nm Lithography in Dana Point, California, May 15, 2001.
Wang et al. “Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design.” Proceedings of SPIE vol. 4562, 21st Annual BACUS Symposium on Photomask Technology, Mar. 2002, p. 406-417.
Hodgkinson, Ian. “Review of birefringent and chiral optical interference coatings.” Optical Interference Coatings, Trends in Optics and Photonics vol. 63, 2001, p. FA1-FA3.
Band, Erster. Lexikon der Optik. 1999, p. 380-387. and certified copy of translation.
Burnett et al. “The Trouble with Calcium Fluoride.” SPIE's OEMagazine, pp. 23-25, Mar. 2002.
Matsuyama et al. “High NA and low residual aberration projection lens for DUV scanner.” Optical Microlithography XV, Proceedings of SPIE, 4691, pp. 687-695, 2002.
Matsuyama et al. “Microlithography lens for DUV scanner.” International Optical Design Conference, Proceedings of SPIE 4832, pp. 170174, 2002.
Matsumoto, et al. “Analysis of Imaging Performance Degradation.” Optical Microlithography XVI, Proceedings of SPIE, 5040, pp. 131-138, 2003.
Owa et al., “Nikon F2 exposure tool development.” Optical Microlithography XVI, Proceedings of SPIE, 5040, pp. 772-780, 2003.
Chiba et al. “New generation projection optics for ArF lithography.” Optical Microlithography XVI, Proceedings of SPIE, 4691, pp. 679686, 2002.
Burnett J H et al.: “Intrinsic Birefringence in Calcium Fluoride and Barium Fluoride”; Physical Review, B. Condensed Matter, American Institute of Physics, New Yori, US, Bd. 64, Nr. 24, Dec. 15, 2001, pp. 241102-1241102-4, XP002218846.
Pastrnak J et al: “Optical Anisotropy of Silicon Single Crystals”; Physical Review B (Solid State), Apr. 15, 1971, USA, Bd. 3, Nr. 8, pp. 2567-2571, XP-001109107.
Chris Van Peski; Memo to PAG Members; “Re: Birefringence of Calcium Fluoride”; written May 7, 2001; XP-002218847.
Chris Van Peski; Memo to Exposure Tool Manufactures and Lens Desginers; “Re: Birefringence of Calcium Fluoride”, written May 7, 2001; XP-002218848.
Burnett J H et al: “Intrinsic Birefringence in 157 nm Materials” at 2nd International Symposium on 157nm Lithography in Dana Point, California on May 15, 2001-XP-002218849.
Burnett et al; “Symmetry of Spatial-Dispersion-Induced Birefringence and Its Implications for CaF2 Ultraviolet Optics”; J. Microlith., Microfab., Microsyst., vol. 1 No. 3, Oct. 2002; pp. 213-224.
Relation between US20030011893 A1, US 20030011896 A1 and WO 02093209.
Burnett, et al., “Intrinsic Birefringence in calcium fluoride”, Preprint Handed Out at 2ndInternational Symposium on 157nm Lithography in Dana Point, California, May 15, 2001.
Shiraishi et al., “Progress of Nikon's F2 Exposure Tool Development” Proceedings of the SPIE, SPIE, Bellingham, VA, US, vol. 4691, Mar. 5-7, 2002, pp. 594-601.
Nogawa H., et al. “System design of a 157 nm scanner”. Optical Microlithogra

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