Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-11-07
2006-11-07
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S327000, C430S328000, C430S330000, C430S905000, C430S910000, C526S268000, C526S281000, C526S282000, C549S355000
Reexamination Certificate
active
07132215
ABSTRACT:
Novel ester compounds having formula (1) wherein A1is a polymerizable functional group having a double bond, A2is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1and R2each are a monovalent hydrocarbon group, or R1and R2may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.
REFERENCES:
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6216738 (2001-04-01), Ruckwied et al.
patent: 6280900 (2001-08-01), Chiba et al.
patent: 6291130 (2001-09-01), Kodama et al.
patent: 6586157 (2003-07-01), Hasegawa et al.
patent: 6596463 (2003-07-01), Hasegawa et al.
patent: 6677101 (2004-01-01), Nishi et al.
patent: 6774258 (2004-08-01), Hasegawa et al.
patent: 2001/0044071 (2001-11-01), Hasegawa et al.
patent: 2002/0004178 (2002-01-01), Hasegawa et al.
patent: 2002/0132182 (2002-09-01), Nishi et al.
patent: 0915382 (1999-05-01), None
patent: 2-27660 (1987-05-01), None
patent: 5-88367 (1990-01-01), None
patent: 62-115440 (1990-03-01), None
patent: 2-19847 (1992-08-01), None
patent: 2-80515 (1993-04-01), None
patent: 2000-314956 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-08-01), None
patent: 9-95479 (1997-09-01), None
patent: 4-215661 (2000-11-01), None
patent: 2002-156760 (2002-05-01), None
JPO English abstract for JP 2002-156760 (Nio et al).
Chemical Abstract 1991:61346 (for Jung et al, Journal of the American Chemical Society, 1991, 113(1), p. 224-32).
Photopolym. Sci. Technol. 7 [3], 507 (1994) Robert D. Allen et al.
Hasegawa Koji
Kinsho Takeshi
Watanabe Takeru
Birch & Stewart Kolasch & Birch, LLP
Lee Sin
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Ester compounds, polymers, resist compositions and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ester compounds, polymers, resist compositions and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ester compounds, polymers, resist compositions and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3682742