Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2006-02-21
2006-02-21
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S330000
Reexamination Certificate
active
07001714
ABSTRACT:
The present invention provides a method of manufacturing a substrate for MVA type or transreflective liquid crystal display device capable of obtaining a substrate for liquid crystal display device having a good display quality while simplifying the production process and a method of manufacturing a liquid crystal display device using same. A positive-working resist is spread over a glass substrate to form a resist layer thereon. The resist layer is exposed to light and developed to form a resist pattern having linear patterns. The linear pattern in the resist pattern is then irradiated with ultraviolet rays. The resist pattern is then subjected to heat treatment at a predetermined temperature to form a structure having a flat portion formed by the melt flow of the linear pattern irradiated with ultraviolet rays and a protrusion formed by the reflow of the linear pattern unirradiated with ultraviolet rays.
REFERENCES:
patent: 6452653 (2002-09-01), Yamanaka et al.
patent: 2002/0167622 (2002-11-01), Fuijbayashi
patent: 2000-187208 (2000-07-01), None
Sawasaki Manabu
Takagi Takashi
Greer Burns & Crain Ltd.
McPherson John A.
Sharp Kabushiki Kaisha
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