Multi-charged beam lens and charged beam exposure apparatus...

Details Multi-charged beam lens and charged beam exposure apparatus... Multi-charged beam lens and charged beam exposure apparatus...

2006-06-13

2006-06-13

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S491100, C430S296000

Reexamination Certificate

active

07060984

ABSTRACT:
A multi-charged beam lens formed by stacking, via insulators, at least three substrates each having a plurality of apertures which pass charged beams. The lens includes a voltage application portion arranged on at least one of the at least three substrates. The voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.

REFERENCES:
patent: 6335127 (2002-01-01), Ono
patent: 6559463 (2003-05-01), Ono et al.
patent: 6603128 (2003-08-01), Maehara et al.
patent: 6617587 (2003-09-01), Parker et al.
patent: 6617595 (2003-09-01), Okunuki
patent: 6872950 (2005-03-01), Shimada et al.
patent: 2001/0052576 (2001-12-01), Shimada et al.
patent: 2001/0054690 (2001-12-01), Shimada et al.
patent: 2002/0000766 (2002-01-01), Ono et al.
patent: 2002/0005491 (2002-01-01), Yagi et al.
Feinerman, A.D., et al. “Sub-centimeter micromachined elecron microscope,”J. Vac. Sci Technol., A 10(4), Jul./Aug. 1992, pp. 611-616.
Lee, K.Y., et al. “High aspect ratio aligned multilayer microstructure fabrication,”J. Vac. Sci. Technol., B 12(6), Nov./Dec. 1994, pp. 3, 3425-3430.
Sasaki, T. “A multibeam scheme for electron-beam lithography,”J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981. pp. 963-965.

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