Resist composition

Details Resist composition Resist composition

2006-08-01

2006-08-01

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S326000

Reexamination Certificate

active

07083892

ABSTRACT:
The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter ion, the compound generating an acid upon irradiation of actinic rays or radiation.

REFERENCES:
patent: 5731364 (1998-03-01), Sinta et al.
patent: 6238842 (2001-05-01), Sato et al.
patent: 6258507 (2001-07-01), Ochiai et al.
patent: 6387590 (2002-05-01), Mizutani et al.
patent: 6406830 (2002-06-01), Inoue et al.
U.S. Appl. No. 10/361,505, filed on Feb. 11, 2003.
U.S. Appl. No. 10/613,044, filed on Jul. 7, 2003.
U.S. Appl. No. 10/654,942, filed on Sep. 5, 2003.

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