Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-10-10
2006-10-10
Ryan, Patrick Joseph (Department: 1745)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192140, C204S192230, C216S037000, C216S083000, C216S087000, C148S599000
Reexamination Certificate
active
07118656
ABSTRACT:
A method for fabricating a stent or other medical device by creating a free standing thin film of metal.
REFERENCES:
patent: 3945903 (1976-03-01), Svendor et al.
patent: 4180448 (1979-12-01), Soshiki et al.
patent: 4486286 (1984-12-01), Lewin et al.
patent: 4582559 (1986-04-01), Tanielian et al.
patent: 4591482 (1986-05-01), Nyce
patent: 4740207 (1988-04-01), Kreamer
patent: 4992153 (1991-02-01), Bergmann et al.
patent: 5061914 (1991-10-01), Busch et al.
patent: 5114504 (1992-05-01), AbuJudom, II et al.
patent: 5306294 (1994-04-01), Winston et al.
patent: 5358615 (1994-10-01), Grant et al.
patent: 5405379 (1995-04-01), Lane
patent: 5421955 (1995-06-01), Lau et al.
patent: 5441515 (1995-08-01), Khosravi et al.
patent: 5443500 (1995-08-01), Sigwart
patent: 5597458 (1997-01-01), Sanchez, Jr. et al.
patent: 5632771 (1997-05-01), Boatman et al.
patent: 5635144 (1997-06-01), Aklufi
patent: 5744377 (1998-04-01), Sekiguchi et al.
patent: 5843289 (1998-12-01), Lee et al.
patent: 5849206 (1998-12-01), Amon et al.
patent: 5873904 (1999-02-01), Ragheb et al.
patent: 5879697 (1999-03-01), Ding et al.
patent: 1 068 842 (1992-10-01), None
patent: WO 99623432 (1999-09-01), None
Crockett & Crockett
Crockett, Esq. K. David
Mercado Julian
Micro Therapeutics Inc.
Ryan Patrick Joseph
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