Sulfonate and a resist composition

Details Sulfonate and a resist composition Sulfonate and a resist composition

2006-02-21

2006-02-21

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S914000, C430S921000, C430S925000, C430S919000, C430S923000, C430S326000, C430S910000, C562S054000, C562S056000

Reexamination Certificate

active

07001706

ABSTRACT:
A sulfonate of the formula (I):wherein Q1, Q2, Q3, Q4and Q5each independently represents a certain substituent, and A+represents a counter ion,with the proviso that at least one of Q1, Q2, Q3, Q4and Q5is a group of the formula (II)wherein R1and R2each independently an alkyl having 1 to 12 carbon atoms or the like; anda chemical amplification type positive resist composition comprising the sulfate of the formula (I) anda resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

REFERENCES:
patent: 5837420 (1998-11-01), Aoai et al.
patent: 6893794 (2005-05-01), Akita et al.
patent: 2004/0152009 (2004-08-01), Yamaguchi et al.

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