Conductor stack shifting

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07131103

ABSTRACT:
A method for integrating a first integrated circuit design having first layers and a second integrated circuit design having second layers into a common reticle set. The second integrated circuit design has a given number of second layers and the first integrated circuit design has less than the given number of layers. At least one of the first layers is duplicated to produce at least one duplicated first layer until the first integrated circuit design has the given number of layers. The first layers and the at least one duplicated first layer are mapped to a modified first integrated circuit design having the given number of first layers. A reticle set is fabricated to include the given number of first layers and second layers, using the modified first integrated circuit design and the second integrated circuit design.

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