Linear chemical mechanical planarization (CMP) system and...

Abrading – Machine – Reciprocating tool

Reexamination Certificate

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C451S296000

Reexamination Certificate

active

07086936

ABSTRACT:
A linear chemical mechanical planarization (CMP) belt pad includes a first portion comprised of a first pad material, e.g., polyurethane, and a second portion comprised of a second pad material, e.g., porous rubber. The first portion has a first end and a second end. The second portion is situated between the first and second ends of the first portion and extends substantially across a width of the belt pad. Alternatively, the second portion may be embedded in the first portion such that a peripheral surface of the second portion is surrounded by a surface of the first portion. A linear CMP system and a method for planarizing a wafer in a single linear CMP module also are described.

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Rodel(R) Finishing Pads, Feb. 1, 2002.
Encyclopedia.com definition of synthetic rubber, Apr. 19, 2003 (see appended site update page).

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