Photosensitive composition

Details Photosensitive composition Photosensitive composition

2006-11-14

2006-11-14

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S287100, C430S280100, C430S326000, C430S905000, C430S906000, C430S910000, C430S944000

Reexamination Certificate

active

07135271

ABSTRACT:
The positive type photosensitive composition of the present invention comprises a polymer compound (A) having, in a side chain thereof, a polymerizable group or a cross-linkable group, and an infrared absorbent (B). Preferably, the polymerizable group or cross-linkable group is incorporated into molecules of the polymer compound (A) through a structural unit having this group in a side chain thereof. Specifically, the structural unit is preferably a structural unit having any one of structures represented by the following general formulae (1) to (4):wherein A, B, X each independently represents a single bond, an oxygen atom, a sulfur atom or the like; L and M each independently represent a bivalent organic group; R1to R12represents a hydrogen atom or a monovalent organic group; R13to R24each independently represents a monovalent organic group; and Y represents an oxygen atom, a sulfur atom, or a phenylene group which may have a substituent.

REFERENCES:
patent: 5731123 (1998-03-01), Kawamura et al.
patent: 6573022 (2003-06-01), Miyake et al.
patent: 2004/0009426 (2004-01-01), Goto et al.
patent: 2004/0067434 (2004-04-01), Kano et al.
patent: 2005/0043173 (2005-02-01), Tsuchimura

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