Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S350000

Reexamination Certificate

active

07135735

ABSTRACT:
A semiconductor device comprising: a support substrate; an embedded insulating layer formed on the support substrate; a semiconductor layer on the embedded insulating layer; at least an element region formed in the semiconductor layer; a plurality of source/drain regions of a first conductivity type, formed in the element region at predetermined intervals; a plurality of body regions of a second conductivity type, sandwiched between a pair of adjacent ones of the source/drain regions in the element region; and a gate formed on each of the body regions with a gate insulating film being laid between them, each of the source/drain regions including: an inner high-concentration portion extending to the embedded insulating layer, and an outer low-concentration portion surrounding the inner high-concentration portion and having a direct contact with the body regions.

REFERENCES:
patent: 5567629 (1996-10-01), Kubo
patent: 2003/0032295 (2003-02-01), Park et al.
patent: 2004/0227248 (2004-11-01), Fukuzumi et al.
patent: 2005/0121710 (2005-06-01), Shino

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