Method of manufacturing micro actuated blazed grating

Details Method of manufacturing micro actuated blazed grating Method of manufacturing micro actuated blazed grating

2006-05-09

2006-05-09

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S319000, C430S330000, C216S013000, C216S024000

Reexamination Certificate

active

07041435

ABSTRACT:
A method for manufacturing a grating is provided. The method includes the steps as follows: a) forming a first insulating layer on a substrate; b) forming a silicon oxide layer on the first insulating layer; c) forming and hard baking a photoresist on the silicon oxide layer for defining a plurality of specific zones; d) etching the first insulating layer and the silicon oxide layer within the specific zones respectively for forming a plurality of concaves; e) forming a second insulating layer on the silicon oxide layer; f) defining a plurality of grating zones onto the second insulating layer, and forming an adhesive layer and a conductive layer on the grating zones in sequence; g) removing parts of the second insulating layer located outside of the grating zones; and h) removing the silicon oxide layer for exposing a plurality of grating structures within the grating zone.

REFERENCES:
patent: 6238581 (2001-05-01), Hawkins et al.
patent: 2004/0027225 (2004-02-01), Lee et al.
patent: 2004/0224523 (2004-11-01), Bae et al.
patent: 6-343272 (1994-12-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing micro actuated blazed grating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing micro actuated blazed grating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing micro actuated blazed grating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3623082