Semiconductor device having a wave-like channel region

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S369000

Reexamination Certificate

active

07105892

ABSTRACT:
A minute semiconductor device having a high driving ability and a manufacturing method thereof are provided. A semiconductor device includes a support substrate, an insulating layer that is formed above the support substrate, a semiconductor layer that is formed above the insulating layer, a channel region that is provided in the semiconductor layer, a source region and a drain region that are formed so as to sandwich the channel region, and a gate electrode that is formed above the channel region via a gate insulating layer. The boundary between the gate insulating layer and the channel region has a wave-like pattern of a gradual slope without any corners.

REFERENCES:
patent: 5665613 (1997-09-01), Nakashima et al.
patent: 5879978 (1999-03-01), Ra
patent: 6465823 (2002-10-01), Yagashita et al.
patent: 6750515 (2004-06-01), Ker et al.
patent: 2002/0011612 (2002-01-01), Hidea
patent: 03-054866 (1991-03-01), None
patent: 04-268767 (1992-09-01), None
patent: 05-075121 (1993-03-01), None
patent: 7-335898 (1995-12-01), None
patent: 03-023011 (1997-01-01), None
patent: 2001-298194 (2001-10-01), None
Patent Abstracts of Japan regarding Publication No. 09-023011 published Jan. 21, 1997.
Patent Abstracts of Japan regarding Publication No. 2001-298194 published Oct. 26, 2001.

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