Semiconductor wafer with improved local flatness, and method...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C451S268000, C451S269000

Reexamination Certificate

active

07077726

ABSTRACT:
A process for producing semiconductor wafers comprises simultaneous grinding of both sides of the semiconductor wafers in a single step, 1S-DDG, wherein this grinding is the only material-removing mechanical machining step which is used to machine the surfaces of the semiconductor wafers. This process produces semiconductor wafers with improved geometry and nanotopology.

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Patent Abstract of Japan corresponding to JP 08-090401.
J. Haisma et al. (Appl. Opt. 33 (34) (1994) 7945).
English Derwent Abstract AN 1999-519699 corresponding to DE 198 33 257.
English Derwent Abstract AN 2000-015536 corresponding to DE 19823904.

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