Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2006-03-14
2006-03-14
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C385S130000
Reexamination Certificate
active
07011932
ABSTRACT:
The invention relates to a process a process for forming single-mode, organic waveguides employing organic polymeric materials. The process reduces dissolved and gaseous oxygen content to very low quantities, resulting in production of waveguides having superior properties and manufacturability. Also provided is a process for preventing loss of light due to cores having flared ends. A waveguide is produced by sequentially a layer of a liquid, photosensitive buffer and clad composition to a surface of a substrate; deoxygenating under vacuum; overall exposing under an inert gas actinic radiation to partially polymerize the compositions below a full curing. Coating a photosensitive core composition to the clad composition; deoxygenating under vacuum, covering with an inert gas atmosphere; positioning a photomask above, but not in contact with the core layer; imagewise exposing the core through a photomask pattern to actinic radiation to partially polymerize the core composition; developing core; coating a photosensitive overclad composition over the image areas of the core composition; deoxygenating under vacuum; overall exposing the overclad composition, under inert gas to actinic radiation to substantially fully cure the optional buffer composition, the underclad composition, the core composition and the clad composition.
REFERENCES:
patent: 4609252 (1986-09-01), Wong et al.
patent: 5106211 (1992-04-01), Chiang et al.
patent: 5861976 (1999-01-01), Hoekstra
patent: 5903697 (1999-05-01), Yamada et al.
patent: 6114090 (2000-09-01), Wu et al.
patent: 6306563 (2001-10-01), Xu et al.
patent: 1-138509 (1989-05-01), None
“Resists in Microlithography”, O'Brien et al., pp. 325 to 376 of Microelectronics Processing: Chemical Engineering Aspects, American Chemical Society, 1989.
Battell Kevin
Beeson Karl W.
Ferm Paul M.
Maxfield Macrae
Pant Deepti
E. I. du Pont de Nemours and Company
McPherson John A.
LandOfFree
Polymer waveguide fabrication process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymer waveguide fabrication process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer waveguide fabrication process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3597975