Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-01-31

2006-01-31

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C430S005000

Reexamination Certificate

active

06992754

ABSTRACT:
A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors51, 52.A separation D1between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors51, 52results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors51, 52results in high reflectivity.

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patent: 2000-28931 (2000-01-01), None
Choksi et al., “Maskless Extreme Ultraviolet Lithography,”Journal of Vacuum Science and Technology, Part B, vol. 17, No. 6, Nov./Dec. 1999, pp. 3047-3051.

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