Negative resist composition comprising base polymer having...

Details Negative resist composition comprising base polymer having... Negative resist composition comprising base polymer having...

2006-07-18

2006-07-18

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C522S129000, C522S146000, C430S921000, C430S914000, C430S925000

Reexamination Certificate

active

07078156

ABSTRACT:
A negative resist composition and a patterning method for semiconductor devices using the composition are provided. In one aspect, a negative resist composition comprises an alkali-soluble base polymer having an epoxy ring substituent, a silicon-containing crosslinker having multiple hydroxy groups, and a photoacid generator. In another aspect, a patterning method includes using the negative resist composition in a bi-layer resist process to form fine patterns.

REFERENCES:
patent: 5457005 (1995-10-01), Babich et al.
patent: 5886102 (1999-03-01), Sinta et al.
patent: 0 466 025 (1992-01-01), None
patent: 0 506 432 (1992-03-01), None

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