Method for inspecting substrate, substrate inspecting system...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S307000, C250S311000

Reexamination Certificate

active

07109483

ABSTRACT:
The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.

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English language translation of Office Action dated Sep. 13, 2005 from Japanese Patent Office in corresponding Japanese patent application No. 2002-542859.
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U.S. Appl. No. 09/985,323, filed Nov. 2, 2001; Mamoru Nakasuji et al.; “Electron Beam Apparatus and Device Production Method Using the Electron Beam Apparatus”.
U.S. Appl. No. 09/985,324, filed Nov. 2, 2001; Toshifumi Kimba et al.; “Apparatus for Inspecting Material with Electron Beam, Method for Operating Same, and Method for Manufacturing Semiconductor Device Using Former”.
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U.S. Appl. No. 09/985,322, filed Nov. 2, 2001; Mamoru Nakasuji et al.; “Electron Beam Apparatus and Method of Manufacturing Semiconductor Device Using the Apparatus”.
International Search Report Dated Jan. 15, 2002.

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