Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-03-14
2006-03-14
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07011912
ABSTRACT:
A method of manufacturing the reticles for manufacturing a semiconductor product using a photolithographic process is relatively error free and can be carried out time in a short amount of time. The method includes creating a first database, in which data of coordinates, regions and process execution conditions for a plurality of pattern images to be transcribed onto various types of semiconductor products, is classified into respective product groups each containing similar ones of the products, creating a second database of process marks and scribe lane regions corresponding to each of the classified product groups; extracting from the second database data for the process mark and scribe lane region of a reticles for manufacturing the product; determining reference coordinates for the process mark based on reference coordinates of the plurality of pattern images and the selected scribe lane region; and designing and forming a reticle through batch-process between the coordinates of the process mark and the reference coordinates of the pattern images.
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patent: 5958635 (1999-09-01), Reich et al.
patent: 6400839 (2002-06-01), Takayama
patent: 6455211 (2002-09-01), Yui et al.
Rosasco S.
Samsung Electronics Co,. Ltd.
Volentine Francos & Whitt PLLC
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