Etching a substrate: processes – Nongaseous phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
Reexamination Certificate
2006-07-04
2006-07-04
Vinh, Lan (Department: 1765)
Etching a substrate: processes
Nongaseous phase etching of substrate
Irradiating, ion implanting, alloying, diffusing, or...
C216S065000, C216S085000, C438S745000
Reexamination Certificate
active
07070702
ABSTRACT:
A method of selectively etching a substrate (1) comprises applying etchant (4) at a surface of the substrate and illuminating an area of the surface with light from a light source (7), whereby etching is at least partially inhibited in the illuminated area (18) of the substrate. Preferably LiNbO3 is patterned in HF KOH, or HF═HNO3 solutions by selective illumination using UV laser light with 300 to 1000 mn wavelength, thereby allowing for interferometric or holographic structures to be formed.
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Barry Ian E
Eason Robert W
Ross Graeme W
Smith Peter G R
Nixon & Vanderhye P.C.
QinetiQ Limited
Vinh Lan
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