Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-05-16
2006-05-16
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S316000, C430S318000
Reexamination Certificate
active
07045256
ABSTRACT:
A method is provided for repairing photolithographic exposure masks. A focused ion-beam exposure of the surface of the exposure mask is used to purposely “damage” this surface over the area where opaque or light-blocking material is required to be present.
REFERENCES:
patent: 5965301 (1999-10-01), Nara et al.
patent: 5965303 (1999-10-01), Huang
patent: 6103430 (2000-08-01), Yang
patent: 6190836 (2001-02-01), Grenon et al.
Chen Same-Ting
Lin Zy Ying
Taiwan Semiconductor Manufacturing Co. Ltd.
Young Christopher G.
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