Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2006-03-28

2006-03-28

Alejandro-Mulero, Luz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C118S7230IR, C118S7230AN

Reexamination Certificate

active

07018506

ABSTRACT:
A plasma processing apparatus comprises a plate that separates a high frequency induction antenna from a vacuum chamber. The plate comprises a nonmagnetic metal plate that has an opening and a dielectric material member that seals the opening. The area of the nonmagnetic metal plate is larger than the area of the dielectric material member.

REFERENCES:
patent: 5904780 (1999-05-01), Tomoyasu
patent: 5916455 (1999-06-01), Kumagai
patent: 2002/0139480 (2002-10-01), Nakajima
patent: 9-115694 (1997-05-01), None
patent: 2000-173985 (2000-06-01), None
patent: 2000-173985 (2000-06-01), None
patent: 2001-28299 (2001-01-01), None
patent: 2001-210628 (2001-08-01), None
patent: 2002-190473 (2002-07-01), None
patent: WO 00/40771 (2000-07-01), None

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