Load cup for chemical mechanical polishing

Abrading – Precision device or process - or with condition responsive... – Computer controlled

Reexamination Certificate

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Details

C451S339000

Reexamination Certificate

active

07101253

ABSTRACT:
A load cup for transferring a substrate in a chemical mechanical polishing system is provided. In one embodiment, a load cup for transferring substrates in a chemical mechanical polishing system includes a substrate support having a first side adapted to support a substrate thereon and at least one actuator coupled to the substrate support and adapted to move the substrate support laterally. In another embodiment, a method for transferring a substrate between a polishing head and a load cup includes sensing a position of the polishing head relative to the load cup and automatically aligning the load cup and polishing head in response to the sensed relative position.

REFERENCES:
patent: 5329732 (1994-07-01), Karlsrud et al.
patent: 5738574 (1998-04-01), Tolles et al.
patent: 5762543 (1998-06-01), Kasprzyk et al.
patent: 5934984 (1999-08-01), Togawa et al.
patent: 5947802 (1999-09-01), Zhang et al.
patent: 6068544 (2000-05-01), Chiu et al.
patent: 6074275 (2000-06-01), Yashiki et al.
patent: 6102777 (2000-08-01), Duescher et al.
patent: 6131589 (2000-10-01), Vogtmann et al.
patent: 6196896 (2001-03-01), Sommer
patent: 6648730 (2003-11-01), Chokshi et al.
patent: 6716086 (2004-04-01), Tobin
patent: 2003/0003848 (2003-01-01), Tobin
patent: 0 347 718 (1989-12-01), None
patent: 1323350 (1987-07-01), None
patent: 99/1022 (1999-08-01), None

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