Polycrystalline silicon liquid crystal display device and...

Details Polycrystalline silicon liquid crystal display device and... Polycrystalline silicon liquid crystal display device and...

2006-09-26

2006-09-26

Chaudhari, Chandra (Department: 2891)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C257SE21413

Reexamination Certificate

active

07112476

ABSTRACT:
A method for fabricating a poly-silicon liquid crystal display device includes forming a poly-silicon layer including a TFT region and a storage capacitor region on a substrate, wherein the capacitor region includes an impurity injection region having a N-type impurity injection region and a P-type impurity injection region; forming a gate electrode and a storage capacitor electrode on the poly-silicon layer; injecting an N-type impurity ion with a high doping density into the N-type impurity injection region and the TFT region; injecting a P-type impurity ion with a high doping density into the P-type impurity injection region; forming an insulating layer on the gate electrode and the storage electrode; and forming a pixel electrode on the insulating layer, wherein the pixel electrode is electrically connected to the impurity injection region in the storage capacitor region. Because the number of masks used for forming the storage capacitor is reduced, the fabricating process of a poly-silicon liquid crystal display device can be simplified.

REFERENCES:
patent: 5719065 (1998-02-01), Takemura et al.
patent: 5814529 (1998-09-01), Zhang
patent: 6589826 (2003-07-01), Park

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