Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

2006-04-04

2006-04-04

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S907000, C430S910000, C430S919000, C430S921000, C430S286100

Reexamination Certificate

active

07022456

ABSTRACT:
A positive photoresist composition comprising:(A) an oxime sulfonate compound represented by the specific formula,(B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and(C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.

REFERENCES:
patent: 5800964 (1998-09-01), Sato et al.
patent: 7-21626 (1995-03-01), None
patent: 7-230165 (1995-08-01), None
patent: 10-139747 (1998-05-01), None
patent: 2000-162768 (2000-06-01), None
Machine-assisted English translation of JP 10-139747, provided by JPO.

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