Extreme ultraviolet reticle protection using gas flow...

Details Extreme ultraviolet reticle protection using gas flow... Extreme ultraviolet reticle protection using gas flow...

2006-04-18

2006-04-18

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S075000, C340S404100, C438S795000

Reexamination Certificate

active

07030959

ABSTRACT:
Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle and a reticle shield to reduce particle contamination on the reticle are disclosed. According to one aspect of the present invention, an apparatus that reduces particle contamination on a surface of an object includes a plate and a gas supply. The plate is positioned in proximity to the object such that the plate, which has a second temperature, and the object, which has a first temperature, are substantially separated by a space. The gas supply supplies a gas flow into the space. The gas has a third temperature that is lower than both the first temperature and the second temperature. The gas cooperates with the plate and the object to create a temperature gradient and, hence, a thermophoretic force that conveys particles in the space away from the object.

REFERENCES:
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patent: 09-253441 (1997-09-01), None
Rader, Daniel J., Verification studies of Thermophoretic for EUV masks, Emerging Lithographic Technologies VI, 2002, SPEI vol. 4688.

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