Method for setting mask pattern and illumination condition

Details Method for setting mask pattern and illumination condition Method for setting mask pattern and illumination condition

2006-09-12

2006-09-12

Rosasco, S. (Department: 1756)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S396000, C430S311000

Reexamination Certificate

active

07107573

ABSTRACT:
A method for setting a mask pattern and an illumination condition suitable for an exposure method for using plural kinds of light to illuminate a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern, so as to resolve the predetermined pattern without resolving the auxiliary pattern on a target via a projection optical system includes the steps of forming data for the predetermined pattern, forming data for the auxiliary pattern, and setting the illumination condition for defining an effective light source of illumination using the plural kinds of light.

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