Methods and apparatus for vacuum thin film deposition

Details Methods and apparatus for vacuum thin film deposition Methods and apparatus for vacuum thin film deposition

2006-09-26

2006-09-26

Tarazano, D. Lawrence (Department: 1773)

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

C427S509000

Reexamination Certificate

active

07112351

ABSTRACT:
The present invention provides a polymer coating method. In the method, in a vacuum chamber, a low temperature monomer evaporation chamber is used to heat a liquid monomer and a cooled substrate at a temperature lower than the liquid monomer reservoir or vapor. The liquid monomer is allowed to condense on the cooled substrate surface where it is polymerized by a radiation source. The process depends on the vapor pressure difference between liquid in the monomer source and liquid condensed on the surface of the cooled substrate. The film thickness is dependent on the temperature difference between the monomer reservoir and the substrate, and the time that is required to move the coated substrate from the evaporation chamber to the cure station. The method is suitable for forming very thin, uniform, pinhole-free, polymer coatings from a variety of monomers, having at least two olefinic groups per molecule, on a variety of substrates.

REFERENCES:
patent: 4842893 (1989-06-01), Yializis et al.
patent: 5440446 (1995-08-01), Shaw et al.
patent: 5681615 (1997-10-01), Affinito et al.
patent: 6103331 (2000-08-01), Kanno
patent: 6214422 (2001-04-01), Yializis
patent: 2001/0041265 (2001-11-01), Yializis et al.
patent: 2004/0024105 (2004-02-01), Kim et al.
P. W Atkins, Physical Chemsitry Ed2, 1982, pp. 188-190.

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