Processes for producing polysiloxanes and photoresist...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C430S905000, C430S907000

Reexamination Certificate

active

07008750

ABSTRACT:
New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

REFERENCES:
patent: 3969543 (1976-07-01), Roberts et al.
patent: 4745169 (1988-05-01), Sugiyama et al.
patent: 5100503 (1992-03-01), Allman et al.
patent: 5240813 (1993-08-01), Watanabe et al.
patent: 5547808 (1996-08-01), Watanabe
patent: 5612170 (1997-03-01), Takemura et al.
patent: 5691396 (1997-11-01), Takemura et al.
patent: 5731126 (1998-03-01), Takemura et al.
patent: 5882844 (1999-03-01), Tsuchiya et al.
patent: 5972560 (1999-10-01), Kaneko et al.
patent: 6087064 (2000-07-01), Lin et al.
patent: 6210856 (2001-04-01), Lin et al.
patent: 6309796 (2001-10-01), Nakashima et al.
patent: 6342562 (2002-01-01), Kozawa et al.
patent: 6420084 (2002-07-01), Angelopoulos et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 2002/0169269 (2002-11-01), Hwang et al.
patent: 1105677 (1995-07-01), None
patent: 8-188649 (1996-07-01), None
patent: 2002-332353 (2002-11-01), None
patent: WO 02/091083 (2002-11-01), None
Machine-assisted English translation of JP 8-188649 (Nakanozo et al.).
Full English translation of JP 8-188649 (Nakanozo et al) provided by PTO.
Partial, Machine-assisted English translation of JP 2002-332353, provided by JPO.
English abstract of CN 1105677 A, provided by DERWENT.
Patent Abstracts of Japan, vol. 1996, No. 11, Nov. 29, 1996 & JP 08 188649 A (Kansai Shin Gijutsu Kenkyusho:KK), Jul. 23, 1996.
Database WPI, Section Ch. Week 200340 Derwent Publications Ltd., London GB; AN 2003-424017, XP002249499 & JP 2002 332353 A (Central Glass Co. Ltd), Nov. 22, 2002 & JP 2002332353 A (Central Glass Co. Ltd); Nov. 22, 2002.
Database WPI, Section Ch, Week 199730, Derwent Publications Ltd., London, GB; AN 1997-320530, XP002249500 & CN 1 105 677 A (Inst. Chem. Chinese Acad. Sci) Jul. 26, 1995.

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