Method and apparatus for transferring a wafer

Material or article handling – Vertically swinging load support

Reexamination Certificate

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Details

C414S935000, C414S941000, C901S015000

Reexamination Certificate

active

06991419

ABSTRACT:
The present invention relates to a transfer apparatus for a wafer, in which the wafer may be transferred in a narrow space by reducing a transfer device footprint. The transfer device has a base, a lower arm, an upper arm and a hand. The lower arm is configured to be vertically adjustable and rotatable on a vertical axis. The upper arm is pivotably coupled to the lower arm, and the hand is horizontally coupled to the upper arm.

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patent: 10-275848 (1998-11-01), None
patent: 2000-195922 (2000-07-01), None
English language abstract for Japanese Patent No. 10-275848.
English language of Abstract for Japanese Patent No. 2000-195922, filed Jul. 14, 2000.

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