Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-07-18
2006-07-18
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S130000, C427S131000, C360S324100, C360S324110, C360S324120
Reexamination Certificate
active
07077936
ABSTRACT:
A laminate structure includes an antiferromagnetic layer, a pinned magnetic layer, and a seed layer contacting the antiferromagnetic layer on a side opposite to pinned magnetic layer. The seed layer is constituted mainly by face-centered cubic crystals with (111) planes preferentially oriented. The seed layer is preferably non-magnetic. Layers including the antiferromagnetic layer, a free magnetic layer, and layers therebetween, have (111) planes preferentially oriented.
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Hasegawa Naoya
Ide Yosuke
Saito Masamichi
Tanaka Ken'ichi
Alps Electric Co. ,Ltd.
McDonald Rodney G.
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