Exposure method and projection exposure apparatus

Details Exposure method and projection exposure apparatus Exposure method and projection exposure apparatus

1992-03-03

1993-03-16

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, G03B 2742

Patent

active

051948931

ABSTRACT:
A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional movement. The substrate is also moved in a direction of optical axis of projection optical system when moved in the direction of one-dimension, such that a central part of transfer area on the substrate is located on a best focal plane of projection optical system upon scan exposure.

REFERENCES:
patent: 4068947 (1978-01-01), Buckley et al.
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4585337 (1986-04-01), Phillips
patent: 4742376 (1988-05-01), Phillips
patent: 4747678 (1988-05-01), Shafer et al.
patent: 4770531 (1988-09-01), Tanaka et al.
patent: 4869999 (1989-09-01), Fukuda et al.
patent: 4902900 (1990-02-01), Kamiya et al.
patent: 4924257 (1990-05-01), Jain
Buckley, Jere D. et al, "Step and scan: A systems overview of a new lithography tool," Optical/Laser Microlithography II, 1989, SPIE vol. 1088, pp. 424-433.

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