Polymers with mixed photoacid-labile groups and photoresists...

Details Polymers with mixed photoacid-labile groups and photoresists... Polymers with mixed photoacid-labile groups and photoresists...

2006-01-24

2006-01-24

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000, C430S914000, C526S320000, C526S329600, C526S332000, C526S333000, C526S334000

Reexamination Certificate

active

06989224

ABSTRACT:
The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.

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