Negative photoresist and method of using thereof

Details Negative photoresist and method of using thereof Negative photoresist and method of using thereof

2006-03-14

2006-03-14

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S905000, C430S906000, C430S907000, C430S909000, C430S910000, C430S914000, C430S921000, C430S311000, C430S313000

Reexamination Certificate

active

07011923

ABSTRACT:
A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The negative photoresist composition comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer. The first and second polymers may also have a repeating unit having an aqueous base soluble moiety. The first and second polymers undergo acid catalyzed crosslinking upon exposure of the acid to radiation, producing a product that is insoluble in an aqueous alkaline developer solution.

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Machine-assisted English translation of JP 9-325492 provided by JPO.

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