Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-30
2005-08-30
Lee, Sin J. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000, C430S914000, C430S325000, C430S326000, C430S330000, C430S311000, C430S945000, C430S942000, C430S966000, C549S268000, C549S271000, C549S272000, C526S266000, C526S280000, C526S281000, C526S284000, C526S271000
Reexamination Certificate
active
06936402
ABSTRACT:
Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4732838 (1988-03-01), Sechi et al.
patent: 5763366 (1998-06-01), Takatsuto et al.
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 6090952 (2000-07-01), Hazra et al.
patent: 6667243 (2003-12-01), Ramsbey et al.
Kim et al “Nonshrinkable Photoresists for ArF Lithography”, Advances in Resist Technology and Processing XX, Proceedings o SPIE vol.5039 (2003), p. 689-697.
Chang, F. C., “Potential Bile Acid Metabolites. 2. 3,7,12-Trisubstituted 5β-Cholanic Acids,”J. Org. Chem.44:4567-4572, American Chemical Society (1979).
Hien, S., et al., “Photoresist Outgassing at 157 nm Exposure,”Proc. SPIE4345:439-447, SPIE (2001).
Choi Jae-Hak
Kim Jin-Baek
Lee Jae-Jun
Oh Tae-Hwan
Korea Advanced Institute Science & Technology
Lee Sin J.
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3518737