Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-08-02
2005-08-02
Whitmore, Stacy A. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
Reexamination Certificate
active
06925626
ABSTRACT:
A method of routing a metal layer trace in an integrated circuit die includes steps of: (a) receiving as input a netlist of an integrated circuit die; (b) selecting a redistribution layer trace from the netlist for routing the redistribution layer trace between an I/O pad of the integrated circuit die and a termination point; (c) comparing a trace width of the redistribution layer trace with a maximum trace width limit; and (d) if the trace width of the redistribution layer trace exceeds the maximum trace width limit, then routing the redistribution layer trace as a plurality of separate parallel traces each having a trace width that is less than the selected maximum trace width limit.
REFERENCES:
patent: 6230306 (2001-05-01), Raspopovic et al.
patent: 6810512 (2004-10-01), Roohparvar
patent: 6826741 (2004-11-01), Johnson et al.
Huang Wei
Nguyen Ken
Fitch Even Tabin & Flannery
LSI Logic Corporation
Whitmore Stacy A.
LandOfFree
Method of routing a redistribution layer trace in an... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of routing a redistribution layer trace in an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of routing a redistribution layer trace in an... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3517596