Photocopying – Projection printing and copying cameras – Methods
Reexamination Certificate
2005-08-09
2005-08-09
Fuller, Rodney (Department: 2851)
Photocopying
Projection printing and copying cameras
Methods
C430S022000, C355S053000, C355S072000, C355S075000
Reexamination Certificate
active
06927842
ABSTRACT:
A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a second gate valve. The alignment load-lock includes an alignment stage that aligns a wafer during pump-down. The alignment load-lock can be uni-directional or bi-directional. The lithography system can include one or multiple alignment load-locks.
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del Puerto Santiago E.
Kreuzer Justin L.
Roux Stephen
ASML Holding N.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
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