Method and apparatus for inspecting pattern defects

Details Method and apparatus for inspecting pattern defects Method and apparatus for inspecting pattern defects

2005-08-09

2005-08-09

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

06927847

ABSTRACT:
An apparatus for inspecting pattern defects on microscopic circuit patterns, with high resolution, comprises: an objective lens for detecting an image of a sample; a UV laser beam illumination arrangement for illuminating onto a pupil of the objective lens; am arrangement for lowering coherency of the UV laser illumination; a detector of integration type; and an arrangement for processing detected signal thereof.

REFERENCES:
patent: 5774222 (1998-06-01), Maeda et al.
patent: 6031607 (2000-02-01), Miyazaki
patent: 6091488 (2000-07-01), Bishop
patent: 6288780 (2001-09-01), Fairley et al.
patent: 6369888 (2002-04-01), Karpol et al.

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