Semiconductor device with SOI region and bulk region and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S349000, C257S250000

Reexamination Certificate

active

06979866

ABSTRACT:
In the SOI region of a semiconductor substrate, a BOX layer is formed underneath with backgate electrodes to control the threshold voltages of MOS transistors formed in the SOI region.

REFERENCES:
patent: 6342717 (2002-01-01), Komatsu
patent: 6538916 (2003-03-01), Ohsawa
patent: 2001/0010380 (2001-08-01), Maeda
patent: 2004/0183131 (2004-09-01), Nagano et al.
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patent: 2000-307117 (2000-11-01), None
patent: 2001-230423 (2001-08-01), None
patent: 466759 (2001-12-01), None
T. Yamada, et al., “An Embedded DRAM Technology on SOI/Bulk Hybrid Substrate Formed with SEG Process for High-End SOC Application”, 2002 IEEE, 2002 Symposium on VLSI Technology Digest of Technical Papers, 2 Pages.
U.S. Appl. No. 10/653,128, filed Sep. 3, 2003, Azuma et al.
U.S. Appl. No. 10/850,106, filed May 21, 2004, Kohyama.

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