Alignable low-profile substrate chuck for large-area...

Details Alignable low-profile substrate chuck for large-area... Alignable low-profile substrate chuck for large-area...

2005-06-07

2005-06-07

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S073000, C355S075000, C355S076000

Reexamination Certificate

active

06903808

ABSTRACT:
An alignable, low-profile substrate chuck for processing, one by one, a number of substrate panels, which may be larger than the chuck itself. The substrate chuck is adjustable in x, y and theta while on the movable platform of a stage, and comprises a nested set of rotatable or sliding brackets adjustable in x, y and theta a positionable vacuum diffuser plate mounted within a coplanar apron on the top bracket. The vacuum diffuser plate fits within a relief cut about the periphery of the apron, which, together with a pattern of islands with their tops coplanar to a ledge formed by the relief, provide location and both bottom and peripheral support for the high-flatness vacuum diffuser plate. The vacuum airflow passes through the vacuum diffuser plate, through the pattern around supporting islands and out through a central yaw shaft about which the yaw rotation centers.

REFERENCES:
patent: 6324933 (2001-12-01), Waskiewicz et al.
patent: 6363809 (2002-04-01), Novak et al.
patent: 6483574 (2002-11-01), Zemel
patent: 6756751 (2004-06-01), Hunter
patent: 6762826 (2004-07-01), Tsukamoto et al.
patent: 2001/0019229 (2001-09-01), Sawai et al.
patent: 2002/0154839 (2002-10-01), Trost
patent: 2003/0098962 (2003-05-01), Kubo

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