Semiconductor device production method and semiconductor device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S623000

Reexamination Certificate

active

06908834

ABSTRACT:
A semiconductor device production method is provided, which comprises the steps of: (a) forming an insulative film on an underlying substrate; (b) forming a semiconductor layer on the insulative film; (c) bonding a flexible substrate onto the semiconductor layer; and (d) separating the semiconductor layer on the flexible substrate from the insulative film on the underlying substrate.

REFERENCES:
patent: 4727047 (1988-02-01), Bozler et al.
patent: 5702963 (1997-12-01), Vu et al.
patent: 5821138 (1998-10-01), Yamazaki et al.
patent: 6156627 (2000-12-01), Zhang et al.
patent: 6326280 (2001-12-01), Tayanaka
patent: 2001/0039103 (2001-11-01), Muramatsu et al.
patent: 0 858 110 (1998-08-01), None
patent: 0 924 769 (1999-06-01), None
patent: 11-251600 (1999-09-01), None
patent: 2001-331120 (2001-11-01), None
European Search Report dated Aug. 26, 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device production method and semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device production method and semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device production method and semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3504860

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.