Apparatus for inspection with electron beam, method for...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S307000, C250S492200

Reexamination Certificate

active

06855929

ABSTRACT:
A substrate inspection apparatus1-1(FIG.1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber23-1maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage26-1with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system20-1and guiding it to a detecting system35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

REFERENCES:
patent: 5986263 (1999-11-01), Hiroi et al.
patent: 6329826 (2001-12-01), Shinada et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6518582 (2003-02-01), Kohama
patent: 0 312 082 (1989-04-01), None
patent: 1 061 359 (2000-12-01), None
patent: 58-018833 (1983-02-01), None
patent: 09-180655 (1997-07-01), None
patent: 11-223662 (1999-08-01), None
patent: 2000-149853 (2000-05-01), None
patent: 2000-161948 (2000-06-01), None
patent: 2000-315712 (2000-11-01), None
patent: 2000-323538 (2000-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for inspection with electron beam, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for inspection with electron beam, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for inspection with electron beam, method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3493864

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.