Method for fabricating spaced-apart nanostructures

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

Reexamination Certificate

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C313S310000

Reexamination Certificate

active

06858521

ABSTRACT:
In accordance with the invention, a spaced-apart array of nanostructures is fabricated by providing a shadow mask having a plurality of spaced apart, relatively large apertures, reducing the size of the apertures to nanoscale dimensions, and depositing a material through the mask to form a plurality of spaced-apart nanostructures. In a preferred embodiment, the spaced apart nanostructures comprise nanoscale islands (nano-islands) of catalyst material, and spaced-apart nanowires such as carbon nanotubes are subsequently grown from the islands.

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