Photosensitive composition and planographic printing plate...

Details Photosensitive composition and planographic printing plate... Photosensitive composition and planographic printing plate...

2005-06-21

2005-06-21

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S170000, C430S171000, C430S270100, C430S286100, C430S302000, C101S453000

Reexamination Certificate

active

06908727

ABSTRACT:
This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a compound having physical and chemical properties that are changed irreversibly by a radical,in-line-formulae description="In-line Formulae" end="lead"?R—SO2−M+  General formula (I)in-line-formulae description="In-line Formulae" end="tail"?wherein R represents an alkyl group or aryl group, and M+represents a counter cation selected from sulfonium, iodonium, diazonium, ammonium and azinium; and a negative planographic printing plate precursor which can be recorded by heat mode using this composition. This invention also describes a planographic printing plate precursor comprising a substrate having disposed thereon a photosensitive layer containing (C-II) a light-heat converting agent, (B-II) a compound having a polymerizable unsaturated group, and (A-II) an onium salt having at least two cation parts in one molecule.

REFERENCES:
patent: 5512418 (1996-04-01), Ma
patent: 6190830 (2001-02-01), Leon et al.
patent: 6623910 (2003-09-01), Shimada et al.
patent: 2001/0036598 (2001-11-01), Shimada et al.
patent: 2002/0072011 (2002-06-01), Murota et al.
patent: 2003/0198893 (2003-10-01), Oshima

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