Short edge smoothing for enhanced scatter bar placement

Details Short edge smoothing for enhanced scatter bar placement Short edge smoothing for enhanced scatter bar placement

2005-02-15

2005-02-15

Whitmore, Stacy A. (Department: 2812)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

06857109

ABSTRACT:
An edge-smoothing process identifies a target edge fragment among a number of edge fragments that form a feature in a photolithographic design. Each of the edge fragments has a length and a classification. The length of the target edge fragment is less than a minimum scatter bar length. The target edge fragment is also classified so that it will receive a scatter bar, and the target edge fragment has a collinear edge fragment. The target edge fragment is smoothed in conjunction with the collinear edge fragment to increase the length of the target edge fragment.

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