Method of exposing a target to a charged particle beam

Details Method of exposing a target to a charged particle beam Method of exposing a target to a charged particle beam

2005-08-02

2005-08-02

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S3960ML, C250S492100, C250S492200, C250S398000

Reexamination Certificate

active

06924494

ABSTRACT:
An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically conductive components of the system downstream from the shield. The surface of the shield lies parallel or approximately parallel to a magnetic equipotential surface of the focusing magnetic field so that the shield does not affect the focusing magnetic field. The shield is, e.g., a ferrite disk or a hollow ferrite cone defining a central bore for passage of the charged particle beam.

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